Web12 feb 2024 · Hidetami Yaegashi, Tokyo Electron Limited. Thin Film Process Technologies for Continued Scaling. Robert Clark, et, al., TEL Technology Center, America, LLC. … WebOne of the practical candidates to produce 7nm node logic devices is to use the multiple patterning with 193-immersion exposure. For the multiple patterning, it is important to evaluate the relation between the number of mask layer and the minimum pitch systematically to judge the device manufacturability.
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http://toc.proceedings.com/26740webtoc.pdf Web361 Silicon Infiltration into Functional Polymer for Nano-scale Pattern Development Kazuki Yamada,1 Masatoshi Yamato,2 Kenichi Oyama,2 Hidetami Yaegashi,2* Takehiro Seshimo,3 Katsumi Ohmori,3 Daisuke Tanaka,4 and Jun Koshiyama4 1 Process Development Center, Tokyo Electron Limited, 650 Mitsuzawa, Hosaka-cho, Nirasaki … cyberpatriot readme
High-etching selectivity of spin-on-carbon hard mask process for …
WebHidetami Yaegashi Kenichi Oyama Masatoshi Yamato Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.) Tokyo Electron Ltd Original Assignee Tokyo Electron Ltd Web16 ott 2024 · Tae Kwon Jee, Vadim Timoshkov, Peter Choi, David Rio, Yu-Cheng Tsai, Hidetami Yaegashi, Kyohei Koike, Carlos Fonseca, and Stijn Schoofs "EUV local CDU healing performance and modeling capability towards 5nm node", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2024, ... WebSPIE Digital Library Proceedings. Contact & Support +1 888 902 0894 (United States) +1 360 685 5580 (International) cyberpatriot national finals 2022